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Boron Trichloride - Specialty Gases

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Boron Trichloride BCl3

Products and applications of Boron Trichloride

Nested Applications

Boron Trichloride - Part 1

Boron Trichloride

Boron Trichloride (BCl3, also known as Trichloroborane) is a pungent and colorless gas, albeit forming fumes in humid air due to its highly reactive nature towards water. Although not flammable, strong toxic and corrosive properties are attributed to Boron Trichloride gas. Its boiling point is at 12,6 °C (285,7 K) and the BCl3 density amounts to 5,172 kg/m3 at 15 °C / 1000 mbar. Furthermore, the BCl3 Lewis structure is already implied by the Boron Trichloride formula and its name: the BCl3 molecular geometry exhibits three Chlorine atoms centered around a single Boron atom, yielding a symmetrical Boron Trichloride Lewis structure as expected.

Boron Trichloride - Part 2

Industrial Manufacturing of Boron Trichloride

Boron Trichloride can be synthesized via various chemical preparation processes, but they differ in their produced volumes and qualities, respectively. A reaction of Boron Trifluoride with Aluminium Chloride yields small volumes of high purity BCl3 via a halogen exchange process, while a chlorination of Boron Oxide (with addition of Carbon) allows to produce large volumes of Boron Trichloride gas. Although the latter process is preferred for production on an industrial scale, BCl3 gas can as well be generated by direct synthesis of elementary Boron and Chlorine.

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High Purity Boron Trichloride

 

Composition
BCl3 ≥ 99.999 %
Impurities
N2  ≤ 5 ppmv
O2 ≤ 3 ppmv
CO ≤ 0.5 ppmv
CO2 ≤ 0.2 ppmv
CH4 ≤ 0.2 ppmv

 

 

Boron Trichloride - Part 3

Applications of Boron Trichloride

There are two distinct ways to utilize Boron Trichloride in the semiconductor industry: within a BCl3 etching or in a doping process. As etchant, high purity Boron Trichloride is used in various specific etching applications, namely anisotropic or pulsed plasma etching, as well as atomic layer etching. These techniques are employed for an efficient BCl3 etching of high-κ dielectrics or metals, in particular of Aluminium in the manufacturing of LCD panels. As dopant however, Boron Trichloride represents an excellent precursor for Boron as a p-type dopant via ion implantation. Both processes are depicted below schematically.

Nested Applications

Boron Trichloride - Etching

BCl3 plasma etching

High purity Boron Trichloride is utilized in various plasma etching methods for an efficient BCl3 etching process, in particular for the etching of Aluminium.

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Boron Trichloride - Doping

BCl3 doping

BCl3 gas is well-established in doping processes of semiconductor circuits via ion implantation with Boron as p-type dopant.

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